发明名称 EXPOSURE APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a function for efficiently performing inspection and verification of log data to a semiconductor exposure apparatus for accumulating and utilizing log data outputted from a plurality of units.SOLUTION: The semiconductor exposure apparatus has a function for setting information (added information) to be added to logs to use the information for separating the logs before starting log collection and recording all information from control measurement drivers 203, 205, 207 in a recording device 210 through a centralized recording device 209 as log data according to exposure processing, extracts only information from a group of operation verification target units and processes the extracted information so as to be used for comparison verification. A log analysis device sets added information (classification added information) for separating a log file and extracts a log element including the classification added information from respective log elements of the log file. Operation of a specific wafer or a reticle is notified and log information is separated by ID (material ID).
申请公布号 JP2015079817(A) 申请公布日期 2015.04.23
申请号 JP20130215199 申请日期 2013.10.16
申请人 CANON INC 发明人 KAWAI KENICHI
分类号 H01L21/027;G06F11/28;G06F11/34 主分类号 H01L21/027
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