| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a film deposition apparatus which is simply configured and can reduce unnecessary consumption of organic materials.SOLUTION: A film deposition apparatus includes: a vapor deposition head 16c which ejects deposition gas including vapor deposition material gas; a treatment vessel 11 which defines a treatment chamber 12 which accommodates a substrate S facing the vapor deposition head and the vapor deposition head 16C; a vapor generating part 31 which generates vapor of the vapor deposition material X; transportation pipes L12 and L13 which connect the vapor generating part to the vapor deposition head 16C and can be heated; a position detection sensor which obtains a relative position between the substrate S and the vapor deposition head 16c; and a first MFC41 which controls rate of carrier gas which is supplied to the vapor generating part depending on the relative position.</p> |
