发明名称 |
NITRIDE SEMICONDUCTOR DEVICE, DIODE AND FIELD EFFECT TRANSISTOR |
摘要 |
<p>PROBLEM TO BE SOLVED: To achieve a nitride semiconductor device which achieves high withstand voltage, further reduction in current collapse and further reduction in leakage current.SOLUTION: A nitride semiconductor device comprises: a substrate 11; a buffer layer 12; an electron transit layer 13; and an electron supply layer 14 on which a two-dimensional electron gas concentration control layer 15, an insulation film 16, an anode electrode 17 having field plate parts 17a, 17b and a cathode electrode 18 are provided. A 2DEG concentration is modulated by the two-dimensional gas control layer 15 from a high-concentration region A to a low-concentration region a across modulation points P, P. The modulation point Plies along a principal surface of the substrate and in a region below the anode electrode 17, and a field intensity between the modulation point Pand an end of the field plate part 17b on the cathode electrode 18 side is made smaller than a field intensity on at least one of the modulation point Pand the end of the field plate part 17b on the cathode electrode 18 side.</p> |
申请公布号 |
JP2015079922(A) |
申请公布日期 |
2015.04.23 |
申请号 |
JP20130217855 |
申请日期 |
2013.10.18 |
申请人 |
FURUKAWA ELECTRIC CO LTD:THE |
发明人 |
UMENO KAZUYUKI;TAKAKI KEISHI;OTOMO SHINYA;RI KO |
分类号 |
H01L29/41;H01L21/329;H01L21/338;H01L29/06;H01L29/47;H01L29/778;H01L29/812;H01L29/861;H01L29/868;H01L29/872 |
主分类号 |
H01L29/41 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|