| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide an imprint device which is advantageous in overlay accuracy.SOLUTION: An imprint device which performs an imprint process of molding an imprint material on a substrate by a mold and forming a pattern on the substrate includes: a heating part which heats regions on the substrate as objects of the imprint process to deform the regions; and a process part which determines one of a first region and a second region as objects of the imprint process as a region to be subjected to the imprint process first, and the other as a region to be subjected to the imprint process later. The influence on the other when the one is deformed by the heating part to have a shape closer to a target shape is smaller than the influence on the one when the other is deformed by the heating part to have a shape closer to the target shape.</p> |
