| 摘要 |
PROBLEM TO BE SOLVED: To provide an exposure device that prevents a deterioration in alignment accuracy between a circuit pattern already transferred onto a plate and a circuit pattern of a mask, while suppressing a reduction of the processing speed (throughput) of the device to the minimum limit.SOLUTION: An exposure device that performs transfer exposure so that a circuit pattern of a mask is overlapped with a circuit pattern of a circuit board through a projection optical system. When the exposure device stores the shape of a circuit board at the time of exposing a first circuit pattern and performs alignment of the first circuit pattern to measure the shape of a plate at the time of exposing a second circuit pattern, and both of the shapes are significantly different from each other, the exposure device generates an error and performs alignment between the mask and the circuit board at all points if measurement for alignment has been performed only at a specific point for the improvement of productivity. |
