发明名称 Digital exposure apparatus and method of exposing a substrate using the same
摘要 A digital exposure apparatus includes a displaceable stage, a light source part, a digital micro mirror part and a micro lens part. A substrate is disposed on the stage. The light source part generates a first light. The digital micro mirror part is disposed over the stage. The digital micro mirror part includes a plurality of digital micro mirrors. The digital micro mirror converts the first light into one or more second light beams. The micro lens part is disposed between the stage and the digital micro mirror part and includes a plurality of micro lenses. The micro lenses convert the one or more second light beams into one or more third light beams which are irradiated upon the substrate. The third light has an oval cross sectional shape.
申请公布号 US9025132(B2) 申请公布日期 2015.05.05
申请号 US201213406828 申请日期 2012.02.28
申请人 Samsung Display Co., Ltd. 发明人 Yun Sang-Hyun;Kim Cha-Dong;Park Jung-In;Sim Su-Yeon;Lee Hi-Kuk
分类号 G03B27/54;G03B27/42;G03F7/20 主分类号 G03B27/54
代理机构 F. Chau & Associates, LLC 代理人 F. Chau & Associates, LLC
主权项 1. A digital exposure apparatus comprising: a stage on which a substrate is disposed, the stage adapted to being displaced; a light source part generating a first light; a digital micro mirror part disposed over the stage and including a plurality of digital micro mirrors, the digital micro mirror converting the first light into one or more beams of a second light; and a micro lens part disposed between the stage and the digital micro mirror part that includes a plurality of micro lenses, each micro lens having an oval shape with a longer axis and a shorter axis wherein the shorter axis is substantially parallel to a displacement direction of the substrate, each micro lens converting a beam of second light into a beam of third light having an oval cross sectional shape which is irradiated upon the substrate.
地址 Yongin, Gyeonggi-Do KR