| 摘要 |
An apparatus for processing a substrate of the present invention comprises: an index unit having a port in which a container where the substrate is put is laid, and an index robot; a process treating unit having a development processing unit in which a first development processing room and a second development processing room which proceed a process for developing the substrate are divided into layers and arranged; and a first pass unit arranged between the development processing unit and the index unit, wherein the first development processing room comprises a development module, a first heating module, and a first main return robot arranged on a transport port which can access the development module and the first heating module, and the first pass unit comprises a second heating module, a first buffer module, a cooling module, a second buffer module, and a first buffer return robot arranged on a transfer port which can access the second heating module, the first buffer module, the cooling module, and the second buffer module. |
