Disclosed is an image sensor. The image sensor of the present invention comprises: a first conductive semiconductor substrate with a trench; a second conductive photoelectric conversion layer which is formed in the semiconductor substrate under the trench; first and second transmission gate electrodes which are arranged by interposing a gate insulating film in the trench; a first charge detecting layer which is formed in the semiconductor substrate on one side of the first transmission gate; and a second charge detecting layer which is formed in the semiconductor substrate on the other side of the second transmission gate electrode.
申请公布号
KR20150050029(A)
申请公布日期
2015.05.08
申请号
KR20130131345
申请日期
2013.10.31
申请人
SAMSUNG ELECTRONICS CO., LTD.
发明人
KIM, SUNG CHUL;KO, HYOUNG SOO;KIM, WON JOO;YUN, JUNG BIN;LEE, KWANG MIN