| 主权项 |
1. A pattern forming method comprising:
(1) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having a repeating unit represented by the following formula (I), (2) a step of exposing the film by using an actinic ray or radiation, and (3) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of the repeating unit represented by formula (I) is 25 mol % or more based on all repeating units in the resin (P): wherein each of R51, R52 and R53 independently represents a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group or an alkoxycarbonyl group, R52 may combine with L5 to form a ring, and in this case, R52 represents an alkylene group; L5 represents a single bond or a divalent linking group, and in the case of forming a ring with R52, L5 represents a trivalent linking group; R1 represents a hydrogen atom or an alkyl group; R2 represents a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an aralkyl group, an alkoxy group, an acyl group or a heterocyclic group; M1 represents a single bond or a divalent linking group; Q1 represents an alkyl group, a cycloalkyl group, an aryl group or a heterocyclic group, and Q1, M1 and R2 may combine with each other to form a ring; and when M1 is a divalent linking group, Q1 may combine with M1 through a single bond or another linking group to form a ring. |
