发明名称 |
SUBSTRATE PROCESING SYSTEM, SUBTRATE HOLDER, SUBSTRATE HOLDER PAIR, SUBSTRATE, BONDING APPARATUS, AND DEVICE MANUFACTURING METHOD |
摘要 |
<p>Provided is a substrate processing system that can restrict flow of dust to regions where semiconductor substrates are mounted, when semiconductor substrates are layered using a pair of substrate holders. The substrate processing system includes a substrate holder system that causes a first substrate holder holding a first substrate and a second substrate holder holding a second substrate to face each other and sandwiches the first substrate and the second substrate, and a processing apparatus that holds the substrate holder system. At least one of the substrate holder system and the processing apparatus includes a dust flow inhibiting mechanism that inhibits flow of dust into a region sandwiching the first substrate and the second substrate.</p> |
申请公布号 |
IN1482DEN2012(A) |
申请公布日期 |
2015.06.05 |
申请号 |
IN2012DE01482 |
申请日期 |
2012.02.17 |
申请人 |
NIKON CORPORATION |
发明人 |
SUGAYA, ISAO;CHONAN, JUNICHI;MAEDA, HIDEHIRO;TANAKA,KEIICHI;YASUDA, TOMOYUKI |
分类号 |
H01L21/683 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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