发明名称 Manufacturing methods of semiconductor substrate, package and device
摘要 A manufacturing method of semiconductor substrate includes following steps: providing a base layer; forming a plurality of traces on the base layer; forming a plurality of studs correspondingly on the traces; forming a molding material layer on the base layer to encapsulate the traces and studs; forming a concave portion on the molding material layer; and, removing the base layer.
申请公布号 US9059050(B2) 申请公布日期 2015.06.16
申请号 US201414159474 申请日期 2014.01.21
申请人 ADVANPACK SOLUTIONS PTE. LTD. 发明人 Lim Shoa-Siong;Lim Kian-Hock
分类号 H01L21/302;H01L23/13;H01L23/498;H01L25/10;H01L21/48;H01L21/56;H01L23/24;H01L23/31 主分类号 H01L21/302
代理机构 McClure, Qualey & Rodack, LLP 代理人 McClure, Qualey & Rodack, LLP
主权项 1. A manufacturing method of semiconductor substrate, package or device, comprising: providing a base layer; forming a first conductive layer on the base layer; forming a second conductive layer on the first conductive layer; forming a molding material layer on the base layer to encapsulate the first and second conductive layers; thinning the molding material layer to form a carrier having a first surface and a second surface opposite the first surface, wherein the first and second conductive layers are embedded in the carrier and electrically connecting the first surface to the second surface; forming a concave portion on the carrier; and removing the base layer.
地址 Kallang SG