EUV PELLICLE FRAME WITH HOLES AND METHOD OF FORMING

摘要

A method of forming an improved EUV mask and pellicle with airflow between the area enclosed by the mask and pellicle and the area outside the mask and pellicle and the resulting device are disclosed. Embodiments include forming a frame around a patterned area on an EUV mask; forming a membrane over the frame; and forming holes in the frame.

主权项

1. A method comprising:
forming a frame around a patterned area on an extreme ultraviolet (EUV) mask; forming a membrane over the frame; forming holes in the frame; and forming holes in the membrane.