发明名称 CHARGED PARTICLE BEAM GENERATING APPARATUS, CHARGED PARTICLE BEAM APPARATUS, HIGH VOLTAGE GENERATING APPARATUS, AND HIGH POTENTIAL APPARATUS
摘要 An instrument producing a charged particle beam according to the present invention is provided with: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing mounted around the plurality of first electrodes. The housing is formed from an insulating solid material, and includes a plurality of second electrodes disposed at positions in proximity to the plurality of first electrodes. At least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.
申请公布号 US2015179387(A1) 申请公布日期 2015.06.25
申请号 US201314406909 申请日期 2013.05.08
申请人 HITACHI HIGH-TECHNOLOGIES CORPORATION 发明人 Onishi Takashi;Watanabe Shunichi;Kaneda Minoru
分类号 H01J29/48;H01J27/02 主分类号 H01J29/48
代理机构 代理人
主权项 1. An instrument producing a charged particle beam, the instrument comprising: a charged particle source; a plurality of first electrodes disposed along a direction of irradiation of charged particles from the charged particle source; a plurality of insulation members disposed between the first electrodes; and a housing disposed around the plurality of first electrodes, wherein: the housing is formed from an insulating solid material, the housing includes a plurality of second electrodes mounted at positions in proximity to the plurality of first electrodes, and at least one of the plurality of second electrodes is electrically connected to at least one of the plurality of first electrodes, each of the plurality of second electrodes having the same potential as the potential of the proximate one of the first electrodes.
地址 Tokyo JP