| 摘要 |
Provided are: a photosensitive transfer material having a support body and a photosensitive resin composition layer, where the photosensitive resin composition layer contains (A) a polymer component containing a polymer having a constituent unit (a1) having a group in which an acid group is protected by an acid-labile group and (B) a photoacid generator, and the photosensitive resin composition layer does not have an ethylene cross-linked structure, and thus the photosensitive transfer material is positive, has superior heat-resistant rectangularity, has superior etchant resistance, has superior resist peeling properties, and has a low occurrence of dust generation when processed; a pattern formation method; and an etching method. |
