发明名称 |
APPARATUS FOR FORMING THIN FILM LAYER AND METHOD FOR FORMING THIN FILM LAYER |
摘要 |
<p>Provided are an apparatus for forming a thin film and a method for forming a thin film. The apparatus for forming a thin film according to one embodiment of the present invention comprises: a first storage unit for storing a first organic material; a first nozzle unit connected to the first storage unit and for injecting the first organic material stored in the first storage unit; a first light irradiation unit disposed adjacent to the first nozzle and for irradiating a light having a wavelength to cure the injected first organic material; a second storage unit for storing a second organic material; a second nozzle unit connected to the second storage unit and for injecting the second organic material stored in the second storage unit; and a second light irradiation unit disposed adjacent to the second nozzle unit and for irradiating a light having a wavelength to cure the injected second organic material.</p> |
申请公布号 |
KR20150081101(A) |
申请公布日期 |
2015.07.13 |
申请号 |
KR20140000746 |
申请日期 |
2014.01.03 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
YI, JEONG HO;KIM, SUN HO;JO, CHEOL RAE;HUH, MYUNG SOO |
分类号 |
H01L51/00;H01L51/52;H01L51/56 |
主分类号 |
H01L51/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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