发明名称 APPARATUS FOR FORMING THIN FILM LAYER AND METHOD FOR FORMING THIN FILM LAYER
摘要 <p>Provided are an apparatus for forming a thin film and a method for forming a thin film. The apparatus for forming a thin film according to one embodiment of the present invention comprises: a first storage unit for storing a first organic material; a first nozzle unit connected to the first storage unit and for injecting the first organic material stored in the first storage unit; a first light irradiation unit disposed adjacent to the first nozzle and for irradiating a light having a wavelength to cure the injected first organic material; a second storage unit for storing a second organic material; a second nozzle unit connected to the second storage unit and for injecting the second organic material stored in the second storage unit; and a second light irradiation unit disposed adjacent to the second nozzle unit and for irradiating a light having a wavelength to cure the injected second organic material.</p>
申请公布号 KR20150081101(A) 申请公布日期 2015.07.13
申请号 KR20140000746 申请日期 2014.01.03
申请人 SAMSUNG DISPLAY CO., LTD. 发明人 YI, JEONG HO;KIM, SUN HO;JO, CHEOL RAE;HUH, MYUNG SOO
分类号 H01L51/00;H01L51/52;H01L51/56 主分类号 H01L51/00
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