<p>The present invention provides a thin film transistor. The thin transistor includes a substrate; an active layer formed on the substrate; a gate insulating film formed on the active layer; a gate electrode formed on the gate insulating film; a doping area formed on the active layer on both sides of the gate electrode; and source and drain electrodes separated from each other on the substrate on both sides of the gate electrode, and making direct contact with the doping area. Therefore, the present invention is able to provide a self-arrangement type semiconductor thin film transistor structure without a contact process.</p>
申请公布号
KR20150081026(A)
申请公布日期
2015.07.13
申请号
KR20140000574
申请日期
2014.01.03
申请人
ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE
发明人
HWANG, CHI SUN;PARK, SANG HEE;CHO, SUNG HAENG;OH, HIM CHAN;YANG, JONG HEON;RYU, MIN KI;BYUN, CHUN WON;PI, JAE EUN;LEE, SU JAE;PARK, JONGH YURK;CHU, HYE YONG