STACKING STRUCTURE HAVING MATERIAL LAYER ON GRAPHENE LAYER AND METHOD OF FORMING MATERIAL LAYER ON GRAPHENE LAYER
摘要
In the present invention, disclosed are stacking structures including a material layer formed on a graphene layer and a method for forming the material layer on the graphene layer where a linear pre-cursor is used on the graphene layer, thereby forming a middle layer as a seed layer when the material layer is formed on the graphene layer with use of an atomic layer deposition method in the disclosed stacking structure.
申请公布号
KR20150081202(A)
申请公布日期
2015.07.13
申请号
KR20140000931
申请日期
2014.01.03
申请人
SAMSUNG ELECTRONICS CO., LTD.;RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY