| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor optical element capable of suppressing generation of micromasks in dry etching.SOLUTION: A method includes: a step S1 of adjusting a ratio of a HO molecule in a process chamber 10a, within a reference range; and a step S2 of arranging wafers Wa and Wb in the adjusted process chamber 10a, and forming substrate products of quantum cascade lasers 1a and 1b from the wafers Wa and Wb. An inner surface of the process chamber 10a is subjected to alumite treatment. The step S1 includes: a step S1a of performing vacuum drawing to the process chamber; a step S1b of performing dry cleaning of the inner surface of the process chamber 10a; and a step S1c of generating a plasma in the process chamber 10a by using a halogen-based gas. |
