发明名称 METHOD FOR FORMING PATTERN
摘要 The invention provides a process and an apparatus for producing a high quality electronic component by reducing sagging at pattern side walls, which may occur when patterns of a wiring, an electrode, etc. are printed by a screen printing process using an electroconductive paste, an insulation paste, or a semiconductor paste, and reducing a mesh mark on the patterns of a wiring, an electrode, etc ., or a full solid surface film, as well as a pattern formation process, by which screen printing can be applied and double face printing can be conducted with the number of process steps less than a conventional process. A pattern is formed by that a pattern is printed on a blanket having a surface comprising polydimethylsiloxane using an electroconductive paste, an insulation paste, or a semiconductor paste by a screen printing process, and the pattern is transferred from the blanket to a printing object.
申请公布号 EP2903007(A1) 申请公布日期 2015.08.05
申请号 EP20130840499 申请日期 2013.09.11
申请人 NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 NOMURA, KENICHI;USHIJIMA, HIROBUMI;IWASE, NORIKO;YOSHIDA, MANABU
分类号 H01B13/00;C09D11/00;H01G4/12;H01G4/30;H01G13/00;H05K3/20 主分类号 H01B13/00
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