发明名称 ELECTROPLATING BATH AND ELECTROPLATING METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide an electroplating bath and an electroplating method, in which upon forming a cobalt or cobalt alloy plating film, a resist layer applied on a conductor is easily inhibited from peeling and adhesiveness between a plating film and the conductor is easily and reliably obtained.SOLUTION: The electroplating bath contains a water-soluble cobalt salt and a conductive salt that enhances conductivity of the electroplating bath. The electroplating bath satisfies, for example, such a condition that the total content of potassium ions and sodium ions is 5 g/L or less. The electroplating bath contains an organic acid that has an acid dissociation constant pKa of 7 or less and has a carboxyl group; and the electroplating bath has a pH lower than the acid dissociation constant pKa of 7 or less of the organic acid. The electroplating method is carried out by energizing the electroplating bath using a conductor as a cathode, which has a layered portion where a resist layer comprising an organic polymer as a base material is layered. Thus, a cobalt or cobalt alloy plating film is formed in an exposed portion where an outer surface of the conductor is exposed.</p>
申请公布号 JP2015161000(A) 申请公布日期 2015.09.07
申请号 JP20140037440 申请日期 2014.02.27
申请人 SHINKO ELECTRIC IND CO LTD;C UYEMURA & CO LTD 发明人 YODA TOSHIHISA;KONDO HITOSHI;SEKIYA TSUTOMU;NOTSU MASAHIRO
分类号 C25D3/12;C25D5/02 主分类号 C25D3/12
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