| 摘要 |
<p>Dosing unit (1) for dosing a precursor into a gas stream, comprises a base body (2) with a first channel (3), which is led from a gas inlet (4) to a gas outlet (5) from the gas stream, and a second channel, which intersects the first channel at an angle (alpha ) at an intersection point. A spray nozzle is arranged in the second channel for supplying the precursor into the gas stream. Independent claims are also included for: (1) a dosing arrangement comprising at least two dosing units, where the dosing units are connected in series in the same gas stream such that many precursors are successively supplied to the gas stream; and (2) depositing a layer on a substrate, comprising producing a plasma jet or a flame from an operating gas, supplying at least one precursor to at least one gas stream into the dosing unit or the dosing arrangement, supplying the gas streams, which are loaded with the precursor to the operating gas, the plasma jet and/or the flame, and reacting the precursor in the plasma jet and the flame, where at least one reaction product of at least one of the precursors is deposited on a surface of the substrate and/or at least on the layer, which is arranged on the surface.</p> |
