| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a gas barrier laminate in which a film is formed on an inorganic film by an atomic layer deposition method, and which has not only high gas barrier property but also excellent productivity.SOLUTION: In a gas barrier laminate 10 in which an ultrathin metal oxide film 5 is formed on an inorganic oxide layer 3 by an atomic layer deposition method, the inorganic oxide layer 3 is formed of a metal oxide or a metal oxynitride containing at least either of Si and Al, and the density of the ultrathin metal oxide is 4.2 g/cmor higher.</p> |
