发明名称 METHOD FOR TREATING A SEMICONDUCTOR
摘要 Methods for treating a semiconductor material, and for making devices containing a semiconducting material, are presented. One embodiment is a method for treating a semiconductor material that includes a chalcogenide. The method comprises contacting at least a portion of the semiconductor material with a chemical agent. The chemical agent comprises a solvent, and an iodophor dissolved in the solvent.
申请公布号 EP2923374(A1) 申请公布日期 2015.09.30
申请号 EP20130857459 申请日期 2013.11.19
申请人 FIRST SOLAR MALAYSIA SDN.BHD 发明人 FOUST, DONALD FRANKLIN
分类号 H01L31/18;H01L21/02 主分类号 H01L31/18
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