| 摘要 |
<p>The present invention relates to a film forming apparatus capable of providing a plurality of types of reaction gas in order with respect to a substrate, and forming a film by supplying gas for substitution, and comprising: a mounting part formed to allow the substrate to be mounted; and a shower head including a flat surface facing the mounting part, and a plurality of gas supplying holes. A ring-shaped protruding part is prepared in the shower head to form a gap between the ring-shaped protruding part and the upper surface of the mounting part. A plurality of gas supplying parts is prepared in a ceiling part formed in the upper side of the shower head. Each of gas supplying parts includes a gas discharging hole formed in a circumferential direction. A diffusion space is arranged to allow the outer edge of the diffusion space to be located more inside than the outer edge of the substrate mounted on the mounting part when viewed from a plane.</p> |
