| 摘要 |
PROBLEM TO BE SOLVED: To provide a pellicle having excellent load resistance and improving flatness of a mask.SOLUTION: A pellicle comprises: a pellicle frame having an opening; a pellicle film covering the opening provided on one end surface of the pellicle frame; and an adhesive layer provided on other end surface of the pellicle frame. A stress relaxation rate of the adhesive layer is 25% or more. |
