发明名称 パターン形成方法及びパターン形成装置
摘要 <p>According to one embodiment, a pattern formation method is disclosed. The method includes preparing a substrate having an underlying pattern and a mold having a concave/convex pattern. The method cures the resin in an uncured region and separate the mold from the resin. The curing the resin includes first and second curing processes. When the uncured region is provided in a plurality, the first process includes performing position alignment of the mold with reference to the substrate, determining a positional displacement amount of the concave/convex pattern with reference to the underlying pattern, and curing the resin in the uncured region having the smallest positional displacement amount. The performing, the determining and the curing are repeated until the uncured regions are reduced to one. When the uncured region is one, the second process includes performing position alignment of the mold with reference to the substrate, and curing the resin.</p>
申请公布号 JP5787922(B2) 申请公布日期 2015.09.30
申请号 JP20130053634 申请日期 2013.03.15
申请人 株式会社東芝 发明人 古殿 瑶子
分类号 H01L21/027;B29C59/02;G03F7/20 主分类号 H01L21/027
代理机构 代理人
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