发明名称 |
A COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCESSES THEREOF |
摘要 |
The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; where R1 to R5 are independently chosen from the group consisting of H and C1-C6 alkyl; R6 is chosen from the group consisting of unsubstituted aryl, substituted aryl, alkyl (C1-C8) and fluoroalkyl (C1-C8) and W is a C2-C6 alkylene spacer. |
申请公布号 |
SG11201506923P(A) |
申请公布日期 |
2015.09.29 |
申请号 |
SG11201506923P |
申请日期 |
2014.05.15 |
申请人 |
AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À.R.L. |
发明人 |
WU, HENGPENG;HONG, SUNGEUN;CAO, YI;YIN, JIAN;PAUNESCU, MARGARETA;THIYAGARAJAN, MUTHIAH |
分类号 |
C08F220/34;C08F8/44;C08F226/10;C09D133/14;C09D139/06;G03F7/039;H01L21/027 |
主分类号 |
C08F220/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|