Charged particle beam writing method and charged particle beam writing apparatus

摘要

A charged particle beam writing method includes determining whether a difference between one of the total area of a pattern and the number of shots in a stripe region with respect to one of adjacent stripe regions of the stripe regions and one of the total area and the number of shots with respect to the other of the adjacent stripe regions exceeds a threshold value, re-dividing, when the difference exceeds the threshold value, a stripe region where the total area or the number of shots is larger than that of the other stripe region in the adjacent stripe regions so that the difference of the total area or the number of shots becomes lower than or equal to the threshold value, and writing a pattern in the stripe regions including a re-divided stripe region, in the writing order of arrangement of the stripe regions.

主权项

1. A charged particle beam writing method comprising:
virtually dividing a writing region of a target object into a plurality of strip-shaped stripe regions; calculating one of a total area of a pattern assigned to a stripe region concerned and a number of shots of a charged particle beam for writing the pattern assigned to the stripe region concerned, for each stripe region of the plurality of stripe regions; determining whether a difference between the one of the total area of the pattern and the number of shots with respect to one of adjacent stripe regions of the plurality of stripe regions and the one of the total area of the pattern and the number of shots with respect to an other of the adjacent stripe regions exceeds a corresponding threshold value; re-dividing, in a case where the difference exceeds the corresponding threshold value as a result of the determining, a stripe region whose one of the total area of the pattern and the number of shots is larger than that of an other stripe region in the adjacent stripe regions so that the difference of the one of the total area of the pattern and the number of shots becomes lower than or equal to the corresponding threshold value; and writing a pattern, with a charged particle beam, in the plurality of stripe regions including the stripe region having been re-divided, in a writing order of arrangement of the plurality of stripe regions.