ION BOMBARDMENT DEVICE AND SUBSTRATE SURFACE CLEANING METHOD USING SAME.

摘要

Provided is an ion bombardment device (1) for stabilizing and cleaning the surface of a substrate. The device is provided with the following: a vacuum chamber (2); at least one electrode (3) that is disposed on the inner wall face of the vacuum chamber (2) and emits electrons; a plurality of anodes (4) that receive the electrons from the electrode (3) and that are arranged so as to face the electrode with the substrate sandwiched therebetween; and a plurality of discharge power sources (5) corresponding to the anodes (4) respectively. Each of the discharge power sources (5) is insulated from the vacuum chamber (2) and provides to the anode (4) corresponding to the relevant discharge power source (5) currents and voltages that can be set independently of one another, thereby generating a glow discharge between such anode (4) and the electrode (3).