Apparatus for speckle reduction, pulse stretching, and beam homogenization

摘要

Embodiments described herein relate to thermal processing of semiconductor substrates. More specifically, embodiments described herein relate to laser thermal processing of semiconductor substrates. In certain embodiments, a uniformizer is provided to spatially and temporally decorrelate a coherent light image.

主权项

1. An apparatus, comprising:
a first microlens array in a propagation path of an input energy; a second microlens array in the propogation path of the input energy; and a temporal decorrelator comprising a plurality of fibers positioned between the first microlens array and the second microlens array, wherein the first microlens array and the second microlens array are in physical contact with the temporal decorrelator.