发明名称 |
Method of providing chloride treatment for a photovoltaic device and a chloride treated photovoltaic device |
摘要 |
A method of manufacturing a photovoltaic device including depositing a cadmium telluride layer onto a substrate; treating the cadmium telluride layer with a compound comprising chlorine and an element from Groups 1-11, zinc, mercury, or copernicium or a combination thereof; and annealing the cadmium telluride layer. A chloride-treated photovoltaic device. |
申请公布号 |
US9147792(B2) |
申请公布日期 |
2015.09.29 |
申请号 |
US201313897915 |
申请日期 |
2013.05.20 |
申请人 |
First Solar, Inc. |
发明人 |
Christensen Scott;Powell Rick C.;Xiong Gang |
分类号 |
H01L21/00;H01L31/18;H01L31/0296;H01L31/073 |
主分类号 |
H01L21/00 |
代理机构 |
Dickstein Shapiro LLP |
代理人 |
Dickstein Shapiro LLP |
主权项 |
1. A method of manufacturing a photovoltaic device, the method comprising:
depositing a cadmium telluride layer over a substrate; treating the cadmium telluride layer with a chloride compound comprising chlorine and one or more elements selected from the group consisting of an element from Groups 1-11, zinc, mercury and copernicium, wherein the cadmium telluride layer is treated during at least a portion of cadmium telluride deposition; annealing the cadmium telluride layer; and following cadmium telluride deposition, depositing a semiconductor reflector layer over the cadmium telluride layer. |
地址 |
Perrysburg OH US |