| 发明名称 | Finned shutter disk for a substrate process chamber | ||
| 摘要 | Shutter disks for use in process chambers are provided herein. In some embodiments, a shutter disk for use in a process chamber may include a body having an outer perimeter, a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, and at least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter, and a bottom surface of the body. | ||
| 申请公布号 | US9147558(B2) | 申请公布日期 | 2015.09.29 |
| 申请号 | US201313742692 | 申请日期 | 2013.01.16 |
| 申请人 | APPLIED MATERIALS, INC. | 发明人 | Chia Bonnie T.;Suh Song-Moon;Tsai Cheng-Hsiung Matthew;Dinsmore Robert;Mori Glen T. |
| 分类号 | C23C14/00;H01J37/32;C23C14/56;H01J37/34 | 主分类号 | C23C14/00 |
| 代理机构 | Moser Taboada | 代理人 | Moser Taboada ;Taboada Alan |
| 主权项 | 1. A shutter disk for use in a process chamber, comprising: a body having an outer perimeter; a top surface of the body, wherein the top surface includes a central portion having a substantially horizontal planar surface, andat least one angled structure disposed radially outward of the central portion, each of the at least one angled structure having a top portion and an angled surface disposed at a downward angle in a radially outward direction from the top portion toward the outer perimeter; and a bottom surface of the body. | ||
| 地址 | Santa Clara CA US | ||