| 发明名称 | Method for fabrication pattern of nano material | ||
| 摘要 | The present invention provides a method for fabricating nano material pattern comprising the steps of forming a perfluorinated polymer pattern on top of the substrate (step 1); spreading a dispersion containing the dispersed nano material on the substrate patterned in step 1) (step 2); and eliminating the perfluorinated polymer pattern formed on the substrate of step 2) (step 3). The method for fabricating nano material pattern of the present invention has advantages over the conventional lift-off method for the fabrication of nano material pattern, which are easiness in eliminating the perfluorinated polymer pattern after forming the nano material pattern with it and no chance of damaging the substrate, suggesting that the method of the invention is excellent in fabricating an excellent nano material pattern. | ||
| 申请公布号 | US9147791(B1) | 申请公布日期 | 2015.09.29 |
| 申请号 | US201414482076 | 申请日期 | 2014.09.10 |
| 申请人 | INHA-Industry Partnership Institute | 发明人 | Park Se-Geun;Lee Jin-Kyun;Kim Myung-Soo;Seokheon Jung |
| 分类号 | H01L21/4763;H01L31/18;H01L51/44 | 主分类号 | H01L21/4763 |
| 代理机构 | Sheridan Ross P.C. | 代理人 | Sheridan Ross P.C. |
| 主权项 | 1. A method for fabricating nano material pattern comprising the following steps: forming a perfluorinated polymer pattern on top of the substrate (step 1); spreading a dispersion containing the dispersed nano material on the substrate patterned in step 1) (step 2); and eliminating the perfluorinated polymer pattern formed on the substrate of step 2) (step 3). | ||
| 地址 | Incheon KR | ||