| 摘要 |
PROBLEM TO BE SOLVED: To provide a resist composition and a resist pattern forming method.SOLUTION: The resist composition, which generates an acid upon exposure and whose solubility in a developer changes by the action of an acid, contains a base component (A) whose solubility in a developer changes by the action of an acid, and an acid generator component (B) which generates an acid upon exposure. The base component (A) contains a polymer compound (A1) having a constituent unit (a0) represented by general formula (a0-1), and the acid generator component (B) contains a compound represented by general formula (b-1) or (b-2). |
