RESIN COMPOSITION AND RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a resin composition from which a resist pattern with good resolution can be produced.SOLUTION: The resin composition comprises: (X1) a resin that includes a structural unit having a salt structure in a side chain, in which an anionic moiety of the salt structure is bonded to the main chain; and (X2) a resin that includes a structural unit having a salt structure in a side chain, in which a cationic moiety of the salt structure is bonded to the main chain. The resins represented by (X1) and (X2) are preferably resins that generate an acid by an action of an acid or light. The cationic moieties of the salt structures in (X1) and (X2) have a common structure and contain an iodonium ion or a sulfonium ion. The anionic moiety includes a sulfonate ion or a carboxylate ion.