MANUFACTURING METHOD OF SEMICONDUCTOR EPITAXIAL WAFER AND SEMICONDUCTOR EPITAXIAL WAFER

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method of a semiconductor epitaxial wafer capable of obtaining a complete crack-free semiconductor epitaxial wafer.SOLUTION: The manufacturing method of a semiconductor epitaxial wafer includes steps of: preparing an epitaxial wafer by epitaxially growing a semiconductor layer on a silicon-based substrate; observing the outer periphery of the prepared epitaxial wafer; and removing cracks, epitaxial layer peeling, and a reaction impression part observed in the observation step.