PRODUCTION METHOD OF SUBSTRATE-ATTACHED VAPOR DEPOSITION MASK DEVICE, SUBSTRATE-ATTACHED VAPOR DEPOSITION MASK AND RESIST PATTERN-ATTACHED SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a production method of a substrate-attached vapor deposition mask device capable of imparting a tension having a proper value to a vapor deposition mask, and suppressing an influence of a shadow without thinning a film thickness.SOLUTION: A production method of a substrate-attached vapor deposition mask device includes the steps for: forming a resist pattern 3 for plating treatment on the substrate 1; and forming a vapor deposition mask 2, by subjecting the resist pattern 3 to the plating treatment as a mask. A cross section of the resist pattern 3 has a tapered shape tapered toward the substrate 1.