发明名称 |
METHOD OF MANUFACTURING BUMP ELECTRODE AND SUBSTRATE FOR FORMING BUMP ELECTRODE |
摘要 |
PROBLEM TO BE SOLVED: To manufacture a bump electrode having high bonding reliability by preventing generation of voids due to remaining of air bubbles in the vicinity of an interface of a base metal layer.SOLUTION: A method of manufacturing a bump electrode comprises: a plating step of forming, in an opening of a resist layer on a substrate, a solder plating layer in a laminated manner on a surface of a metal layer exposed in the opening by electrolytic plating; a resist layer removal step of removing the resist layer after the plating step; an etching step of forming a base metal layer having an outer diameter smaller than that of the solder plating layer by etching the metal layer after removal of the resist layer; and a reflow treatment step of melting the solder plating layer above the base metal layer to form a solder bump on the base metal layer. |
申请公布号 |
JP2015170661(A) |
申请公布日期 |
2015.09.28 |
申请号 |
JP20140043197 |
申请日期 |
2014.03.05 |
申请人 |
MITSUBISHI MATERIALS CORP |
发明人 |
MINEO KYOHEI;KATASE TAKUMA;ISHIKAWA MASAYUKI |
分类号 |
H01L21/60 |
主分类号 |
H01L21/60 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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