发明名称 MASK AND PATTERN FORMING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a mask on which high-precision patterns can be easily formed, and to provide a pattern forming method.SOLUTION: According to one embodiment, a mask includes a first pattern portion and an intermediate member. The first pattern portion includes a plurality of first light transmission parts disposed periodically and having transmissivity with respect to light, and first shielding parts provided between the plurality of first light transmission parts and having a transmittance with respect to the light lower than a transmittance of the plurality of first light transmission parts. The intermediate member is provided on the first pattern portion. The intermediate member has a thickness in accordance with the wavelength of the light and a first period of the first light transmission parts.
申请公布号 JP2015169803(A) 申请公布日期 2015.09.28
申请号 JP20140044725 申请日期 2014.03.07
申请人 TOSHIBA CORP 发明人 INENAMI RYOICHI;ITO SHINICHI;SATO TAKASHI
分类号 G03F1/50;G03F1/32;G03F1/38;H01L21/027 主分类号 G03F1/50
代理机构 代理人
主权项
地址