| 摘要 |
Provided is a measuring apparatus for measuring optical characteristic values and/or an optical film thickness value of a thin film, whereby higher speed measurement is achieved and more accurate measurement results can be obtained. A measuring apparatus (101) for measuring values including optical characteristic values and/or optical film thickness value of a thin film formed on a monitor substrate (Sm) is provided with: an optical signal generating mechanism (10), which generates a plurality of optical signals by modulating monochromatic light to be at set frequencies different from each other by each light source unit, said monochromatic light having been generated by means of a plurality of LED units (11a-11f) using an optical filter; an irradiation mechanism (20), which generates multiplexed signals by multiplexing the optical signals, and which radiates the multiplexed signals toward the monitor substrate (Sm) through an optical fiber; a detecting mechanism (30), which detects the multiplexed signals through the optical fiber, said multiplexed signals having been reflected by means of the monitor substrate (Sm), and which outputs electric signals; a signal separating mechanism (50), which performs filter processing of a band pass filter with respect to the electric signals outputted from the detecting mechanism (30), and which separates component signals by each set frequency from the electric signals; and a calculating mechanism (80) which calculates, on the basis of the thus separated component signals by each set frequency, the optical characteristic values by each set frequency, said optical characteristic values being indicated by the component signals. The measuring apparatus measures the optical characteristics values at one time. |
