| 摘要 |
A chemically amplified positive resist composition is provided comprising an alkali-insoluble or substantially alkali-insoluble polymer having an acid labile group-protected acidic functional group, an alkyl vinyl ether polymer, a photoacid generator, and a benzotriazole compound in a solvent. The composition forms on a substrate a resist film of 5-100 µm thick which can be briefly developed to form a pattern at a high sensitivity and a high degree of removal or dissolution to bottom. |
