SOLID-STATE IMAGING DEVICES AND METHODS OF FABRICATING THE SAME

摘要

Solid-state imaging devices and fabrication methods thereof are provided. The solid-state imaging device includes a substrate containing a first photoelectric conversion element and a second photoelectric conversion element. A color filter layer has a first color filter component and a second color filter component respectively disposed above the first and second photoelectric conversion elements. A light-shielding partition is disposed between the first and second color filter components. The light-shielding partition has a height lower than that of the first and second color filter components. A buffer layer is disposed between the first and second color filter components and above the light-shielding partition. The buffer layer has a refractive index lower than that of the color filter layer.

主权项

1. A solid-state imaging device, comprising:
a substrate containing a first photoelectric conversion element and a second photoelectric conversion element firmed therein; a color filter layer having a first color filter component disposed above the first photoelectric conversion element and a second color filter component disposed above the second photoelectric conversion element; a light-shielding partition disposed between the first color filter component and the second color filter component, wherein the light-shielding partition has a height lower than that of the first and second color filter components; a buffer layer disposed between the first color filter component and the second color filter component and above the light-shielding partition, wherein the buffer layer has a refractive index lower than that of the color filter layer; and a microlens structure disposed above the color filter layer.