| 发明名称 |
SLURRY FOR CHEMICAL-MECHANICAL POLISHING OF METALS AND USE THEREOF |
| 摘要 |
A composition and a method for chemical mechanical polishing. The composition includes a surfactant anion an alkyl alcohol and a diluent. The composition further includes abrasive particles and an oxidizer. The method includes providing the composition on a surface to be polished and polishing the surface by contacting the surface with a polishing pad. |
| 申请公布号 |
US2015267084(A1) |
申请公布日期 |
2015.09.24 |
| 申请号 |
US201514733235 |
申请日期 |
2015.06.08 |
| 申请人 |
International Business Machines Corporation |
发明人 |
Bates Graham M.;Brigham Michael T.;Comeau Joseph K.;Ritter Jason P.;Tiersch Matthew T.;Shah Eva A.;White Eric J. |
| 分类号 |
C09G1/04 |
主分类号 |
C09G1/04 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
1. A composition, comprising:
a minimum of about 32% by weight of a surfactant anion; between about 0.8% by weight and about 1.2% by weight of an alkyl alcohol; and a diluent. |
| 地址 |
Armonk NY US |
