发明名称 TIN OR TIN ALLOY ELECTROPLATING BATH AND PROCESS FOR PRODUCING BUMPS USING SAME
摘要 A tin or tin alloy electroplating bath and a process for producing a bump using the same are disclosed. The electroplating bath includes an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof; and leveling agents containing at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of α,β-unsaturated carboxylic acids, α,β-unsaturated carboxylic acid amides, and salts thereof. The process includes forming a coating film of a tin or tin alloy on a substrate with an electroplating bath as set forth above; and then performing reflow treatment.
申请公布号 US2015267310(A1) 申请公布日期 2015.09.24
申请号 US201514661450 申请日期 2015.03.18
申请人 C. Uyemura & Co., Ltd. 发明人 IKUMOTO Raihei;TSUJIMOTO Masanobu;KANO Toshikazu
分类号 C25D3/32;H05K3/40;C25D5/50;C25D3/60;C25D5/02 主分类号 C25D3/32
代理机构 代理人
主权项 1. A tin or tin alloy electroplating bath comprising: an inorganic acid and an organic acid, as well as a water-soluble salt thereof; a non-ionic surfactant selected from the group consisting of polyoxyalkylene phenyl ethers, polyoxyalkylene polycyclic phenyl ethers, and salts thereof, wherein the phenyl or polycyclic phenyl group in the non-ionic surfactant may be substituted with C1-24 alkyl or hydroxy group; and leveling agents comprising: at least one selected from the group consisting of aliphatic aldehydes, aromatic aldehydes, aliphatic ketones, and aromatic ketones; and at least one selected from the group consisting of α,β-unsaturated carboxylic acids, α,β-unsaturated carboxylic acid amides, and salts thereof.
地址 Osaka JP