| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a technique for removing the sediment containing a metal of small ionization tendency, produced in a capacitively coupled parallel plate plasma processing apparatus.SOLUTION: There is provided a method for removing sediment formed on an upper electrode. The sediment is produced by etching a metal layer containing a metal, by using plasma generated between the lower electrode and upper electrode of a lower structure in a plasma processing apparatus. A method MT1 of removing the sediment formed on the upper electrode performs a plurality of cycles, each including step ST12 for making ions collide against a first sediment on the upper electrode, and step ST13 for removing a second sediment produced by the above-mentioned step and formed on the lower structure.</p> |
