发明名称 |
SEMICONDUCTOR DEVICE |
摘要 |
Provided is a highly integrated semiconductor device, a semiconductor device with large storage capacity with respect to an area occupied by a capacitor, a semiconductor device capable of high-speed writing, a semiconductor device capable of high-speed reading, a semiconductor device with low power consumption, or a highly reliable semiconductor device. The semiconductor device includes a first transistor, a second transistor, and a capacitor. A conductor penetrates and connects the first transistor, the capacitor, and the second transistor. An insulator is provided on a side surface of the conductor that penetrates the capacitor. |
申请公布号 |
US2015270288(A1) |
申请公布日期 |
2015.09.24 |
申请号 |
US201514659656 |
申请日期 |
2015.03.17 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
YAMAZAKI Shunpei;SUZAWA Hideomi |
分类号 |
H01L27/12;H01L29/16;H01L29/786;H01L29/06;H01L49/02;H01L29/78;H01L27/06;H01L29/24 |
主分类号 |
H01L27/12 |
代理机构 |
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代理人 |
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主权项 |
1. A semiconductor device comprising:
a first transistor, the first transistor comprising:
a first semiconductor;a first insulator; anda first conductor; a second insulator over the first transistor; a capacitor over the second insulator, the capacitor comprising:
a second conductor;a third conductor; anda third insulator; a fourth insulator over the capacitor; and a second transistor over the fourth insulator, the second transistor comprising:
a second semiconductor;a fifth insulator; anda fourth conductor, wherein a part of the first conductor overlaps with the first semiconductor with the first insulator interposed therebetween, wherein a part of the fourth conductor overlaps with the second semiconductor with the fifth insulator interposed therebetween, wherein a part of the second conductor faces the third conductor with the third insulator interposed therebetween, wherein the second conductor is electrically connected to the first conductor through a first opening in the second insulator, and wherein the second conductor is electrically connected to the second semiconductor through a second opening in the fourth insulator. |
地址 |
Atsugi-shi JP |