发明名称 |
PATTERN PLACEMENT ERROR AWARE OPTIMIZATION |
摘要 |
Disclosed herein is a computer-implemented method to improve a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising: computing a multi-variable cost function of a plurality of design variables that are characteristics of the lithographic process, and reconfiguring the characteristics of the lithographic process by adjusting the design variables until a predefined termination condition is satisfied. The multi-variable cost function may be a function of one or more pattern shift errors. Reconfiguration of the characteristics may be under one or more constraints on the one or more pattern shift errors. |
申请公布号 |
WO2015139951(A1) |
申请公布日期 |
2015.09.24 |
申请号 |
WO2015EP54448 |
申请日期 |
2015.03.03 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
HSU, DUAN-FU, STEPHEN;JIA, JIANJUN;LIU, XIAOFENG;ZHANG, YOUPING |
分类号 |
G03F7/20;G03F1/36 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|