发明名称 SEMICONDUCTOR DEVICE
摘要 A transistor includes a multilayer film in which an oxide semiconductor film and an oxide film are stacked, a gate electrode, and a gate insulating film. The multilayer film overlaps with the gate electrode with the gate insulating film interposed therebetween. The multilayer film has a shape having a first angle between a bottom surface of the oxide semiconductor film and a side surface of the oxide semiconductor film and a second angle between a bottom surface of the oxide film and a side surface of the oxide film. The first angle is acute and smaller than the second angle. Further, a semiconductor device including such a transistor is manufactured.
申请公布号 US2015270404(A1) 申请公布日期 2015.09.24
申请号 US201514733489 申请日期 2015.06.08
申请人 Semiconductor Energy Laboratory Co., Ltd. 发明人 SATO Takahiro;NAKAZAWA Yasutaka;CHO Takayuki;KOSHIOKA Shunsuke;TOKUNAGA Hajime;JINTYOU Masami
分类号 H01L29/786;H01L29/04;G02F1/1362;H01L27/12;H01L27/32;G02F1/1368;H01L29/24;H01L29/423 主分类号 H01L29/786
代理机构 代理人
主权项 1. (canceled)
地址 Atsugi-shi JP