发明名称 MEMS Structures and Methods for Forming the Same
摘要 A method includes forming a MEMS device, forming a bond layer adjacent the MEMS device, and forming a protection layer over the bond layer. The steps of forming the bond layer and the protection layer include in-situ deposition of the bond layer and the protection layer
申请公布号 US2015266722(A1) 申请公布日期 2015.09.24
申请号 US201514731823 申请日期 2015.06.05
申请人 TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. 发明人 Liu Ping-Yin;Huang Xin-Hua;Huang Hsin-Ting;Hsieh Yuan-Chih;Peng Jung-Huei;Chao Lan-Lin;Tsai Chia-Shiung;Cheng Chun-Wen
分类号 B81B7/00;B81B3/00 主分类号 B81B7/00
代理机构 代理人
主权项 1. A device comprising: a substrate; a micro-electro-mechanical system (MEMS) device over the substrate, wherein the MEMS device comprises: a movable element as a first capacitor plate of a capacitor; anda fixed element as a second capacitor plate of the capacitor; a bond ring encircling the MEMS device, wherein the bond ring comprises a metal; and a protection layer over the bond ring, wherein the protection layer is capable of forming a eutectic metal with the bond ring.
地址 Hsin-Chu TW