APPARATUS FOR AND METHOD OF ACTIVE CLEANING OF EUV OPTIC WITH RF PLASMA FIELD

摘要

Apparatus for and method of cleaning an electrically conductive surface of an optical element in a system for generating extreme ultraviolet radiation in which electrically conductive surface is used as an electrode for generating a plasma which cleans the surface.

主权项

1. Apparatus comprising:
an EUV optical element having an electrically conductive surface; and an electrically conductive member arranged adjacent and electrically coupled to the electrically conductive surface, the electrically conductive surface and the electrically conductive member being arranged with respect to each other such that a plasma is produced when RF power is supplied to the electrically conductive member, the plasma being capable of removing contaminants from at least a portion of the electrically conductive surface.